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1

Comparative study of TiN and TiN/Ti as bottom electrodes for layered type devices with phase transition VO 2 films

Mian, Md. Suruz, Okimura, Kunio, Kohzaki, Masao

Journal:

Thin Solid Films

Year:

2017

Language:

english

File:

PDF, 1.83 MB

english, 2017

2

Activities of Sputtering and Plasma Process (SP) Division; スパッタリングおよびプラズマプロセス技術（SP）部会の活動;

Journal:

Vacuum and Surface Science

Year:

2018

File:

PDF, 684 KB

2018

3

Growth of VO2 films with metal-insulator transition on silicon substrates in inductively coupled plasma-assisted sputtering

Kunio Okimura, Naotaka Kubo

Journal:

Thin Solid Films

Year:

2007

Language:

english

File:

PDF, 612 KB

english, 2007

4

Phase selective growth and characterization of vanadium dioxide films on silicon substrates

Watanabe, Tomo, Okimura, Kunio, Hajiri, Tetsuya, Kimura, Shin-ichi, Sakai, Joe

Journal:

Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 1.73 MB

english, 2013

5

Radio frequency substrate biasing effects on the insulator-metal transition behavior of reactively sputtered VO2 films on sapphire (001)

Azhan, Nurul Hanis, Su, Kui, Okimura, Kunio, Sakai, Joe

Journal:

Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 3.21 MB

english, 2015

6

Oriented growth of VO2(B) thin films on Mo foils by reactive sputtering for lithium ion batteries

Su, Kui, Naka, Takuya, Azhan, Nurul Hanis, Okimura, Kunio, Higuchi, Masashi

Journal:

Thin Solid Films

Year:

2016

Language:

english

File:

PDF, 2.04 MB

english, 2016

7

Large modification in insulator-metal transition of VO 2 films grown on Al 2 O 3 (001) by high energy ion irradiation in biased reactive sputtering

Azhan, Nurul Hanis, Okimura, Kunio, Ohtsubo, Yoshiyuki, Kimura, Shin-ichi, Zaghrioui, Mustapha, Sakai, Joe

Journal:

Journal of Applied Physics

Year:

2016

Language:

english

File:

PDF, 3.36 MB

english, 2016

8

Fabrication of amorphous silicon nitride thin films by radio-frequency sputtering assisted by an inductively coupled plasma

Ishii, Yuki, Kaneko, Tetsuya, Okimura, Kunio, Shindo, Haruo, Isomura, Masao

Journal:

Thin Solid Films

Year:

2017

Language:

english

File:

PDF, 1.45 MB

english, 2017

9

Recrystallization of VO 2 films into (011)-oriented micrometer-sized grains on Al 2 O 3 (001) in biased reactive sputtering

Azhan, Nurul Hanis, Okimura, Kunio, Matsuoka, Kohei, Zaghrioui, Mustapha, Sakai, Joe

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2017

Language:

english

File:

PDF, 5.19 MB

english, 2017

10

Impurities in SiO2 films deposited by plasma-enhanced chemical vapor deposition using tetraethoxysilane

Naohira Maeda, Kunio Okimura, Akira Shibata, Kouzou Tsuchida, Eiji Saji

Journal:

Electrical Engineering in Japan

Year:

1997

File:

PDF, 672 KB

1997

11

The dissociation process in plasma-enhanced chemical vapor deposition using tetraethoxysilane

Naohiro Maeda, Kunio Okimura, Akira Shibata

Journal:

Electrical Engineering in Japan

Year:

1999

Language:

english

File:

PDF, 4.21 MB

english, 1999

12

Plasma cleaning of Si surfaces for TiO2 film deposition

Akira Shibata, Kazumaro Kita, Kunio Okimura

Journal:

Electronics and Communications in Japan (Part II: Electronics))

Year:

2000

Language:

english

File:

PDF, 155 KB

english, 2000

13

Advantages of inductively coupled plasma-assisted sputtering for preparation of stoichiometric VO2 films with metal–insulator transition

Yusuke Nihei, Yusuke Sasakawa, Kunio Okimura

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 356 KB

english, 2008

14

Ti ion density in inductively coupled plasma enhanced dc magnetron sputtering

Tadashi Nakamura, Kunio Okimura

Journal:

Year:

2004

Language:

english

File:

PDF, 255 KB

english, 2004

15

Mass spectrometry and absorption spectroscopy for oxidation of titanium target in rf magnetron sputtering

Kunio Okimura, Tadashi Nakamura, Akira Shibata

Journal:

Year:

2000

Language:

english

File:

PDF, 144 KB

english, 2000

16

Low temperature growth of rutile TiO2 films in modified rf magnetron sputtering

Journal:

Surface and Coatings Technology

Year:

2001

Language:

english

File:

PDF, 308 KB

english, 2001

17

Characteristics of rutile TiO2 films prepared by r.f. magnetron sputtering at a low temperature

Kunio Okimura, Naohiro Maeda, Akira Shibata

Journal:

Thin Solid Films

Year:

1996

Language:

english

File:

PDF, 462 KB

english, 1996

18

Investigation of SiO2 deposition processes with mass spectrometry and optical emission spectroscopy in plasma enhanced chemical vapor deposition using tetraethoxysilane

Naohiro Maeda Horii, Kunio Okimura, Akira Shibata

Journal:

Thin Solid Films

Year:

1999

Language:

english

File:

PDF, 358 KB

english, 1999

19

Autopsy case of congenital pulmonary lymphangiectasis

Hiroshi Hirano, Takashi Nishigami, Akira Okimura, Keiji Nakasho, Kunio Uematsu

Journal:

Pathology International

Year:

2004

Language:

english

File:

PDF, 432 KB

english, 2004

20

using in-air time-resolved x-ray diffraction

Hada, Masaki, Okimura, Kunio, Matsuo, Jiro

Journal:

Physical Review B

Year:

2010

Language:

english

File:

PDF, 101 KB

english, 2010

21

Pulsed laser-deposited VO2 thin films on Pt layers

Sakai, Joe, Zaghrioui, Mustapha, Ta Phuoc, Vinh, Roger, Sylvain, Autret-Lambert, Cécile, Okimura, Kunio

Journal:

Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 1.60 MB

english, 2013

22

Photo-induced lattice softening of excited-state VO2

Hada, Masaki, Okimura, Kunio, Matsuo, Jiro

Journal:

Applied Physics Letters

Year:

2011

Language:

english

File:

PDF, 742 KB

english, 2011

23

Effect of conductive TiN buffer layer on the growth of stoichiometric VO2 films and the out-of-plane insulator–metal transition properties

Mian, Md. Suruz, Okimura, Kunio

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2014

Language:

english

File:

PDF, 2.77 MB

english, 2014

24

Temperature-dependent Raman and ultraviolet photoelectron spectroscopy studies on phase transition behavior of VO2 films with M1 and M2 phases

Okimura, Kunio, Hanis Azhan, Nurul, Hajiri, Tetsuya, Kimura, Shin-ichi, Zaghrioui, Mustapha, Sakai, Joe

Journal:

Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.72 MB

english, 2014

25

Growth of Highly Oriented CoCrTa films by Inductively Coupled Plasma-Assisted Sputtering

Okimura, Kunio, Yamauchi, Kumiko

Journal:

Japanese Journal of Applied Physics

Year:

2003

Language:

english

File:

PDF, 212 KB

english, 2003

26

Epitaxial Growth of V 2 O 3 Thin Films on c -Plane Al 2 O 3 in Reactive Sputtering and Its Transformation to VO 2 Films by Post Annealing

Okimura, Kunio, Suzuki, Yasushi

Journal:

Japanese Journal of Applied Physics

Year:

2011

Language:

english

File:

PDF, 822 KB

english, 2011

27

Titanium atom densities in reactive rf magnetron sputtering for TiO[sub 2] deposition

Nakamura, Tadashi, Okimura, Kunio

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2002

Language:

english

File:

PDF, 325 KB

english, 2002

28

Impact of thermal expansion of substrates on phase transition temperature of VO2 films

Sakai, Joe, Zaghrioui, Mustapha, Matsushima, Masaaki, Funakubo, Hiroshi, Okimura, Kunio

Journal:

Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 2.27 MB

english, 2014

29

In situ x-ray diffraction studies on epitaxial VO[sub 2] films grown on c-Al[sub 2]O[sub 3] during thermally induced insulator-metal transition

Okimura, Kunio, Sakai, Joe, Ramanathan, Shriram

Journal:

Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 478 KB

english, 2010

30

Low-temperature oriented growth of vanadium dioxide films on CoCrTa metal template on Si and vertical metal–insulator transition

Okimura, Kunio, Mian, Md.Suruz

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2012

Language:

english

File:

PDF, 1.86 MB

english, 2012

31

Dissociation processes in plasma enhanced chemical vapor deposition of SiO[sub 2] films using tetraethoxysilane

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

1998

Language:

english

File:

PDF, 544 KB

english, 1998

32

Ionic densities and ionization fractions of sputtered titanium in radio frequency magnetron sputtering

Okimura, Kunio, Nakamura, Tadashi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2003

Language:

english

File:

PDF, 370 KB

english, 2003

33

X-ray Diffraction Study of Electric Field-Induced Metal–Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate

Okimura, Kunio, Sasakawa, Yusuke, Nihei, Yusuke

Journal:

Japanese Journal of Applied Physics

Year:

2006

Language:

english

File:

PDF, 215 KB

english, 2006

34

EFFECT OF LIGHT IRRADIATION ON ELECTRIC-FIELD-INDUCED RESISTANCE SWITCHING PHENOMENON IN PLANAR VO 2 /c-Al 2 O 3 STRUCTURE

MOHAMAD, NURUL EZREENA, OKIMURA, KUNIO, SAKAI, JOE

Journal:

International Journal of Nanoscience

Year:

2009

Language:

english

File:

PDF, 220 KB

english, 2009

35

Preparation of VO 2 Films with Metal-Insulator Transition on Sapphire and Silicon Substrates by Inductively Coupled Plasma-Assisted Sputtering

Okimura, Kunio, Kubo, Naotaka

Journal:

Japanese Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 199 KB

english, 2005

36

Electric Field Induced Metal-Insulator Transition of Vanadium Dioxide Films on Sapphire Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering

Okimura, Kunio, Nihei, Yusuke, Sasakawa, Yusuke

Journal:

Solid State Phenomena

Year:

2007

Language:

english

File:

PDF, 379 KB

english, 2007

37

Electric-Field-Induced Multistep Resistance Switching in Planar VO 2 / c -Al 2 O 3 Structure

Okimura, Kunio, Ezreena, Nurul, Sasakawa, Yusuke, Sakai, Joe

Journal:

Japanese Journal of Applied Physics

Year:

2009

Language:

english

File:

PDF, 349 KB

english, 2009

38

Effects of energetic substrate-incident ions on the growth of crystalline vanadium dioxide films in inductively coupled plasma-assisted sputtering

Mian, Md. Suruz, Okimura, Kunio

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 276 KB

english, 2014

39

Changes in Lattice Parameters of VO 2 Films Grown on c -Plane Al 2 O 3 Substrates across Metal–Insulator Transition

Okimura, Kunio, Sakai, Joe

Journal:

Japanese Journal of Applied Physics

Year:

2009

Language:

english

File:

PDF, 402 KB

english, 2009

40

Effect of Annealing with Ar Plasma Irradiation for Transparent Conductive Nb-Doped TiO 2 Films on Glass Substrate

Hojo, Mika, Okimura, Kunio

Journal:

Japanese Journal of Applied Physics

Year:

2009

Language:

english

File:

PDF, 206 KB

english, 2009

41

Self-oscillation up to 9 MHz based on voltage triggered switching in VO2/TiN point contact junctions

Mian, Md. Suruz, Okimura, Kunio, Sakai, Joe

Journal:

Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 1.30 MB

english, 2015

42

Deposition of High-Quality TiO 2 Films by RF Magnetron Sputtering with an Auxiliary Permanent Magnet

Okimura, Kunio, Shibata, Akira

Journal:

Japanese Journal of Applied Physics

Year:

1997

Language:

english

File:

PDF, 288 KB

english, 1997

43

Effect of Heating Probe on Reactively Sputtered TiO 2 Film Growth

Shibata, Akira, Okimura, Kunio, Yamamoto, Yukio, Matubara, Kakuei

Journal:

Japanese Journal of Applied Physics

Year:

1993

Language:

english

File:

PDF, 427 KB

english, 1993

44

In-Plane Orientation and Annealing Behavior of Rutile TiO 2 Films on MgO Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering

Okimura, Kunio, Furumi, Takahiro

Journal:

Japanese Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 278 KB

english, 2005

45

Epitaxial Growth of Rutile TiO 2 Films on MgO Substrate in Inductively Coupled Plasma-Assisted Sputtering

Okimura, Kunio, Furumi, Takahiro

Journal:

Japanese Journal of Applied Physics

Year:

2004

Language:

english

File:

PDF, 136 KB

english, 2004

46

Polarized Raman scattering of large crystalline domains in VO2 films on sapphire

Zaghrioui, Mustapha, Sakai, Joe, Azhan, Nurul Hanis, Su, Kui, Okimura, Kunio

Journal:

Vibrational Spectroscopy

Year:

2015

Language:

english

File:

PDF, 748 KB

english, 2015

47

Preparation of Rutile TiO$_{\bf 2}$ Films by RF Magnetron Sputtering

Okimura, Kunio, Shibata, Akira, Maeda, Naohiro, Tachibana, Kunihide, Noguchi, Youichiro, Tsuchida, Kouzou

Journal:

Japanese Journal of Applied Physics

Year:

1995

File:

PDF, 995 KB

1995

48

Time-dependent Characteristics of Electric Field-induced Metal–Insulator Transition of Planer VO 2 /c-Al 2 O 3 Structure

Okimura, Kunio, Sakai, Joe

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 458 KB

english, 2007

49

Dynamically Babinet-invertible metasurface: a capacitive-inductive reconfigurable filter for terahertz waves using vanadium-dioxide metal-insulator transition

Urade, Yoshiro, Nakata, Yosuke, Okimura, Kunio, Nakanishi, Toshihiro, Miyamaru, Fumiaki, Takeda, Mitsuo W., Kitano, Masao

Journal:

Year:

2016

Language:

english

File:

PDF, 754 KB

english, 2016

50

Anisotropic Babinet-Invertible Metasurfaces to Realize Transmission-Reflection Switching for Orthogonal Polarizations of Light

Nakata, Yosuke, Urade, Yoshiro, Okimura, Kunio, Nakanishi, Toshihiro, Miyamaru, Fumiaki, Takeda, Mitsuo Wada, Kitano, Masao

Journal:

Physical Review Applied

Year:

2016

Language:

english

File:

PDF, 2.18 MB

english, 2016

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